昆山Ultra-high resolution field emission scanning electron microscope SU9000

Classification:昆山Field emission scanning electron microscope (FE-SEM)
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Date of issue:2021-11-18 11:33:24

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Specially designed for high-resolution imaging of electron beam sensitive samples and advanced semiconductor devices that require up to 3 million times stable observation.

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Specially designed for high-resolution imaging of electron beam sensitive samples and advanced semiconductor devices that require 3 million times stable observation.

image.png The new electron gun and electron optical design improve the low acceleration voltage performance.

0.4 nm / 30 kV (SE)

1.2 nm / 1 kV (SE)

0.34 nm / 30 kV (STEM)

image.png Use improved high vacuum performance and unparalleled electron beam stability to achieve high-efficiency cross-sectional observation.

image.png The newly designed Super E x B energy filtering technology is used to efficiently and flexibly collect SE/BSE/STEM signals.