EDS in SEM analyzes high spatial resolution and low energy end performance. Combining Extreme electronic circuit, windowless design with optimized design of geometric structure and sensor, the sensitivity is 15 times higher than that of traditional large-area SDD.

◆ Equipment characteristics

Can detect and image lithium

When the accelerating voltage is less than 2kV, the spatial resolution in the bulk sample is less than 10nm

Characterize materials at acceleration voltages below 1kV

In conjunction with immersion electron microscopes, high-quality element information can be collected under acceleration voltages up to 30kV

The Ultim Extreme silicon drift detector is a breakthrough in the application of high-resolution field emission scanning electron microscopy, providing solutions far beyond traditional micro and nano analysis.

Ultim Extreme is a windowless energy spectrum in the Ultim Max series, with a crystal area of 100mm2, optimized to maximize sensitivity and spatial resolution. It adopts a racetrack structure design to optimize the imaging and EDS performance of the high-resolution field emission scanning electron microscope when working at low accelerating voltage and short working distance. Using Ultim Extreme, the spatial resolution of EDS is close to that of the scanning electron microscope.

Ultim Extreme is a breakthrough solution for high-resolution field emission scanning electron microscopy applications. The detector realizes EDS data acquisition and element analysis under low acceleration voltage (such as 1-3kV) and very short working distance, so as to analyze the element information of nanomaterials and surface under high SEM resolution.

High-resolution field emission scanning electron microscopy can be used to study smaller nanostructures, interfaces and surfaces. However, under these analysis conditions, the working distance is very small, the working voltage is not very low, and the beam current needs to be as small as possible to make full use of the electronic signal of the detector in the lens barrel, but there is no EDS that can provide such element characterization. The emergence of Ultim Extreme has changed this status quo. It is designed for this type of analysis:

◆ Optimized geometric design

Work at a smaller working distance

Make the solid angle as high as possible on the traditional EDS installation interface. The solid angle is usually 5 times larger than that of the Ultim 170, and the distance between the sensor and the sample is shortened to half of that of an ordinary detector

◆ Windowless design

Compared with any other large-area detectors, while the solid angle is improved, the sensitivity to low-energy end X-rays is increased by 10 to 30 times

The new electronic circuit improves the sensitivity to very low energy X-rays and enhances the analysis capability of low energy X-rays at high count rates

Combine AZtec Live and Tru-Q ® analysis engine to realize data processing and analysis under low acceleration voltage

Optimize TruMap for low-voltage peak overlap correction

In order to achieve this unique geometry, Ultim Extreme uses a non-circular 100mm2 sensor and a windowless design, which has been successfully used in the X-Max N 100TLE to optimize the sensitivity of the TEM. In addition, the detector adopts a new and smaller electronic trap design, which can perform accurate quantitative analysis at a voltage of up to 7kV, and perform qualitative analysis of elements at a higher energy.

After-sales service

Free on-site installation: No

Warranty period: consult the engineer for details

Can the warranty period be extended: Yes

Warranty maintenance commitment: consult the engineer for details

Commitment to repair: consult the engineer for details

Free instrument maintenance: consult the engineer for details

Free training: consult the engineer for details

On-site technical consultation: Yes