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常州Spherical aberration field emission transmission electron microscope HF5000

常州Spherical aberration field emission transmission electron microscope HF5000

  • Classification:常州Transmission Electron Microscope (TEM/STEM)
  • Number of Views:second
  • Date of issue:2021-11-18 10:44:14
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200 kV phase difference correction TEM/STEM balances spatial resolution, tilt and analysis performance. The monopole achieves 0.078 nm STEM spatial resolution, high sample inclination and high solid angle EDX.
  • characteristic
  • Specifications
  • option
  • function
  • Observation example

1. The spherical aberration corrector for the irradiation system produced by Hitachi is equipped as standard (with automatic correction function)


2. Equipped with a cold-field FE electron gun with high brightness and high stability


3. The high stability of the mirror body and power supply greatly improves the performance of the body


4. Observe the aberration-corrected SEM/STEM image while observing the atomic resolution SE image


5. Adopt a new sample stage structure and sample rod with samples placed on the side


6. Support the symmetrical configuration of high solid angle EDX* (symmetric Dual SDD*)


7. Adopt a new structure of the body shell cover


8. Equipped with high-performance sample rod produced by Hitachi*


*Options


◆ High-brightness cold-field FE electron gun × high stability × Hitachi-made spherical aberration corrector

Based on the high-brightness cold-field FE electron source technology accumulated over the years, optimization is carried out to further realize the high stability of the electron gun.


In addition, the mirror body, power supply system and sample stage were updated to support the observation of sub-Å images and improved mechanical and electrical stability, and then used in combination with Hitachi’s spherical aberration corrector.


Not only can the probe with higher brightness and more precision be obtained stably, but also the automatic aberration correction function can realize rapid correction, which makes it easy to exert the inherent performance of the device. Make aberration correction more practical.


Si (211) single crystal HAADF-STEM image (left) and image intensity curve distribution (bottom right), FFT power spectrum (top right)


◆ Symmetric Dual SDD* supporting high solid angle EDX*


Support dual configuration of 100 mm2 SDD detector to achieve higher sensitivity and processing power for EDX element analysis.


Since the second detector is located opposite to the first detector, there is almost no change in the amount of signal detection in X-rays due to the tilt of the sample. Therefore, even if it is a crystalline sample, there is no need to worry about the amount of signal, and elemental analysis can be performed completely in accordance with the direction and position of the sample.


In addition, for electron beam sensitive samples and samples with low X-ray radiation, in addition to atomic column mapping, it is also extremely effective in low-magnification, wide-field, high-definition mapping and other fields.

GaAs(110)的原子柱EDX映射


◆ Simultaneous observation of aberration corrected SEM image/STEM image


Equipped with a standard secondary electron detector, which can simultaneously observe aberration-corrected SEM/STEM images. By simultaneously observing the surface and internal structure of the sample, the three-dimensional structure of the sample can be grasped.


In aberration-corrected SEM images, in addition to improving the resolution by correcting spherical aberration, it is also possible to obtain a more realistic image of the sample surface.

日立扫描电子显微镜

SEM/ADF-/BF-STEM image of Au/CeO2 catalyst (upper section) and high-resolution image of Au particles (lower section)

◆ Main specifications



◆ Body size/weight



◆ Installation conditions


Before purchasing, please set up the scheduled installation place to measure vibration, magnetic field and noise. If it exceeds the allowable value, please be sure to consult separately.


Please contact us separately for the allowable value.


Remarks*1: Option. *2: Windows is a registered trademark of Microsoft Corp. in the United States and other countries. *3: Specifications and dimensions are subject to different manufacturers, models and configurations.


◆ Layout example


※Using the above configuration (including maintenance tools), the total weight of the whole equipment is about 5,000kg.


※Please check the ground strength (kg/m2)>3×the total weight of the equipment (kg)/area area (m2).


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