徐州Micro sampling system

Classification:徐州Focused ion beam system
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Date of issue:2021-11-18 10:46:30

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The micro-sampling method (patented in Japan and the United States) has become a tool in the field of semiconductor device analysis, and it is rapidly developing in the direction of smaller samples. It only takes about an hour to obtain a tiny sample for STEM analysis, and its positioning accuracy can reach 0.1 µm or less.

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Observation example

◆ Focused ion beam (FIB) micro-sampling device and focused ion beam (FIB) micro-sampling method

◆ Focused ion beam (FIB) micro-column sample preparation example

A micro-pillar sample contains an analysis point that is accurately cut directly from the semiconductor device. Change the direction of the incident focused ion beam (FIB) to cut or process the micro-sample into any shape.

◆ Focused ion beam-scanning transmission electron microscope system

The newly developed semiconductor device evaluation system consists of the FB2200 focused ion beam (FIB) system and the HD-2700 200 kV (STEM) scanning transmission electron microscope. From searching for material defects (organizations) to high-precision structure analysis of sub-nano thin films, it only takes a few hours to complete.

Focused ion beam-transmission electron microscope (scanning transmission electron microscope) (FIB-TEM (STEM)) sample rods are interchangeable and shared

◆ DRAM observation example

SEM image of the micro-columnar sample at the tip of the tip Bright-field STEM image of the micro-column sample